发明名称 |
POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, AND KIT FOR PREPARING POLISHING COMPOSITION |
摘要 |
Provided are a polishing composition comprising a water-soluble polymer that has a molecular structure comprising a plurality of repeat unit species having different SP values and a polishing composition exhibiting an etching rate and an abrasive adsorption in prescribed ranges when determined by prescribed methods. Also provided is a method for producing a polishing composition, using an abrasive, a basic compound, a water-soluble polymer having an alkaline-hydrolytic functional group, and water. The method comprises a step of obtaining an agent A comprising at least the basic compound and a step of obtaining an agent B comprising at least the water-soluble polymer H. |
申请公布号 |
EP2977423(A1) |
申请公布日期 |
2016.01.27 |
申请号 |
EP20140767647 |
申请日期 |
2014.03.14 |
申请人 |
FUJIMI INCORPORATED |
发明人 |
TSUCHIYA, KOHSUKE;TANSHO, HISANORI;ICHITSUBO, TAIKI |
分类号 |
C09K3/14;B24B37/00;C09G1/02;H01L21/02;H01L21/304 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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