Resist composition, compound, polymeric compound and method of forming resist pattern

摘要

A resist composition comprising a compound (m0) (wherein Rb1 represents an electron withdrawing group; Rb2 and Rb3 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb2 and Rb3 may be mutually bonded to form a ring with the sulfur atom; and X0− represents a monovalent counteranion).;

主权项

1. A resist comprising:
a base component (A) which exhibits changed solubility in a developing solution under action of acid, a solvent, and an acid generator component (B0) comprising a compound (B0-1) represented by general formula (b0) shown below:wherein Rb1 represents a perfluoroalkyl group of 1 to 4 carbon atoms, a nitro group, a hydroxy group, a cyano group, an acyl group of 1 to 4 carbon atoms or a halogen atom; Rb2 and Rh3 each independently represents an unsubstituted phenyl group; and X1− represents a monovalent counteranion capable of generating a strong acid.