发明名称 INORGANIC LAYER STRUCTURE COMPRISING ORGANIC LINKING MATERIAL, AND METHOD OF FABRICATING THE SAME
摘要 Provided is an inorganic structure. The inorganic structure includes: a metal oxide film; and an organic linking material including a linking atom combined with a metal atom of the metal oxide film. The objective of the present invention is to provide the inorganic layer structure capable of minimizing generation of pin-holes.
申请公布号 KR20160009120(A) 申请公布日期 2016.01.26
申请号 KR20140088728 申请日期 2014.07.15
申请人 IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) 发明人 HAN, KYU SEOK;SUNG, MYUNG MO
分类号 C23C16/44;C23C16/40 主分类号 C23C16/44
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