发明名称 |
INORGANIC LAYER STRUCTURE COMPRISING ORGANIC LINKING MATERIAL, AND METHOD OF FABRICATING THE SAME |
摘要 |
Provided is an inorganic structure. The inorganic structure includes: a metal oxide film; and an organic linking material including a linking atom combined with a metal atom of the metal oxide film. The objective of the present invention is to provide the inorganic layer structure capable of minimizing generation of pin-holes. |
申请公布号 |
KR20160009120(A) |
申请公布日期 |
2016.01.26 |
申请号 |
KR20140088728 |
申请日期 |
2014.07.15 |
申请人 |
IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) |
发明人 |
HAN, KYU SEOK;SUNG, MYUNG MO |
分类号 |
C23C16/44;C23C16/40 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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