发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THEREOF USING A FLOWABLE MATERIAL DURING THE CONTROL GATE REMOVAL FOR WORD LINE END FORMATION
摘要 A memory device is provided having a plurality of floating gates and control gates, which at least one control gate has been removed after applying a flowable material to the semiconductor which prevents damage to the substrate when the control gate is removed. Methods of manufacturing such a memory device are also provided.
申请公布号 US2016020216(A1) 申请公布日期 2016.01.21
申请号 US201414333893 申请日期 2014.07.17
申请人 Macronix International Co., Ltd. 发明人 Lin Shang-Wei;Hsu Yu-Wei;Hung Yu-Min;Han Tzung-Ting
分类号 H01L27/115;H01L21/28 主分类号 H01L27/115
代理机构 代理人
主权项
地址 Hsinchu TW