发明名称 PHOTOSENSITIVE COMPOSITION
摘要 Provided is a photosensitive composition that uses, as a photopolymerization initiator, a compound that is useful as a highly sensitive photopolymerization initiator that is activated by efficiently absorbing near-ultraviolet light of 365nm or the like, has excellent stability and low sublimation. The photosensitive composition includes a photopolymerization initiator (A) comprising a compound represented by general formula (I), and a polymerizable compound (B) including an ethylenically unsaturated bond. In the compound represented by general formula (I), it is preferable that R10 is: a hydrogen atom; a C1-12 alkyl group substituted with a hydroxyl group, a carboxyl group, a halogen atom, a cyano group, or a nitro group; or a non-substituted C1-12 alkyl group.
申请公布号 WO2016009871(A1) 申请公布日期 2016.01.21
申请号 WO2015JP69399 申请日期 2015.07.06
申请人 ADEKA CORPORATION 发明人 KANEHARA, YUKIKO;TAMACHI, TOMOYA;ARIYOSHI, TOMOYUKI
分类号 C08F2/48;C07D295/10 主分类号 C08F2/48
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