LINEAR SOURCE KEEPING THIN FILM UNIFORMITY

摘要

The present invention provides a linear evaporation source capable of overcoming a non-uniform distribution in material flux caused by an amount of residue of a material in a long crucible of a linear evaporation source different in accordance with position during a long time deposition process, and retaining continuous uniform thin film distribution. According to the above objective of the present invention, an inner plate baffle is placed on the crucible containing the material, and an outer plate baffle is separately installed in the inner plate baffle from the inner plate baffle. The inner plate baffle has holes concentrated only in a fixed section on a center part, and has both ends except the same formed with a blocked plane without a hole. The outer plate baffle has uniform hole distribution in order for the material flux to be uniform while evaporated matters passing through the inner plate baffle passes through the outer plate baffle. In order to increase the effect, a number of outer plate baffles can be installed.