发明名称 METHOD OF MANUFACTURING LIGHT EMITTING ELEMENT
摘要 A method of manufacturing a semiconductor light emitting element includes providing a semiconductor stacked layer body; forming an insulating layer on a portion of the semiconductor stacked layer body; forming a light-transmissive electrode covering an upper surface of the semiconductor stacked layer body and an upper surface of the insulating layer, and on a region at least partially overlapping a region for disposing an extending portion in a plan view; forming a light reflecting layer in each of the openings of the light-transmissive electrode; forming a protective layer on a main surface side of the semiconductor stacked layer body; forming a mask on an upper surface of the protective layer except for the region for forming the pad electrode; etching the protective layer to form an opening in the protective layer; and forming a pad electrode in the opening of the protective layer.
申请公布号 US2016020363(A1) 申请公布日期 2016.01.21
申请号 US201514802985 申请日期 2015.07.17
申请人 Nichia Corporation 发明人 KITAHAMA Shun;EMURA Keiji;DAIKOKU Shinichi
分类号 H01L33/40;H01L33/44;H01L33/38;H01L33/42 主分类号 H01L33/40
代理机构 代理人
主权项 1. A method of manufacturing a semiconductor light emitting element that includes a substrate, a semiconductor stacked layer body on a main surface of the substrate, a light-transmissive electrode disposed on the semiconductor stacked layer body, a pad electrode having an external connection portion and an extending portion, the external connection portion being electrically connected to the light-transmissive electrode for electrically connecting to outside, and the extending portion being extending from the external connection portion, and a protective layer covering the semiconductor stacked layer body and the light-transmissive electrode, the method comprising: providing a semiconductor stacked layer body; forming an insulating layer on a portion of the semiconductor stacked layer body such that, in a plan view, the insulating layer partially overlaps at least a portion of a region for forming a pad electrode; forming a light-transmissive electrode covering an upper surface of the semiconductor stacked layer body and an upper surface of the insulating layer, and on a region at least partially overlapping a region for disposing an extending portion in a plan view, the light-transmissive electrode intermittently defining openings in an extending direction of the extending portion; forming a light reflecting layer, made of a metal material, in each of the openings of the light-transmissive electrode, the light reflecting layer extending in the extending direction onto a portion of the light-transmissive electrode at each end of each opening; forming a protective layer on the main surface side of the substrate; forming a mask on an upper surface of the protective layer except for the region for forming the pad electrode, such that, in a plan view, the mask covers both ends of the light-reflecting layer in a direction perpendicular to the extending direction; etching the protective layer to form an opening in the protective layer by using wet etching to remove the protective layer exposed in an opening of the mask; and forming a pad electrode in the opening of the protective layer.
地址 Anan-shi JP
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