STRIPPER COMPOSITION FOR REMOVING PHOTORESIST AND STRIPPING METHOD OF PHOTORESIST USING THE SAME

摘要

The present invention relates to a stripper composition for removing photoresist, which comprises: a chained amine compound of which the weight-average molecular weight is greater than or equal to 95 g/mol; a chained amine compound of which the weight-average molecular weight is less than or equal to 90 g/mol; a cyclic amine compound; an amide-based compound of which one or two straight or branched chain alkyl groups having 1-5 carbon atoms are substituted on nitrogen; and a polar organic solvent. According to the present invention, the weight ratio of the chained amine compound with the weight-average molecular weight of greater than or equal to 95 g/mol to the chained amine compound with the weight-average molecular weight of less than or equal to 90 g/mol is 1:1 to 1:10. The present invention further relates to a photoresist stripping method using the stripper composition.