| 发明名称 |
POLISHING PAD AND POLISHING METHOD |
| 摘要 |
The present invention provides a polishing pad including a polishing member having a polishing surface, wherein the polishing member contains a material having dilatancy characteristics. |
| 申请公布号 |
US2016016292(A1) |
申请公布日期 |
2016.01.21 |
| 申请号 |
US201414774681 |
申请日期 |
2014.02.27 |
| 申请人 |
KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION ;FUJIBO HOLDINGS, INC. |
发明人 |
DOI Toshiro;SESHIMO Kiyoshi;TAKAGI Masataka;KASHIWADA Hiroshi |
| 分类号 |
B24D13/00 |
主分类号 |
B24D13/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A polishing pad comprising a polishing member having a polishing surface, wherein the polishing member comprises a material having dilatancy characteristics. |
| 地址 |
Fukuoka-shi, Fukuoka JP |
