发明名称 VACUUM SYSTEM, IN PARTICULAR A PLASMA SYSTEM, HAVING A COMPLETELY ENCLOSED CHAMBER EXTRUDED PROFILE
摘要 The invention relates to a vacuum system (10), in particular in the form of a plasma system. The vacuum system (10) has a vacuum chamber (12), the side walls of the vacuum chamber (12) being designed in the shape of a continuously closed chamber extruded profile. A first end face of the chamber extruded profile is preferably closed with a plate. A second end face of the chamber extruded profile, which is diametrically opposite the first end face, has a reversibly openable and closeable door (16). The door (16) is fixed preferably by at least one hinge (18, 20) pivotably on the chamber extruded profile. The continuously closed side walls transverse to the longitudinal axis of the chamber extruded profile enable a simple and cost-efficient manufacture of the vacuum chamber (12). The vacuum chamber (12) is preferably accommodated at least partially in a housing (14) which is likewise formed at least partially in the form of an extruded profile.
申请公布号 WO2016008844(A1) 申请公布日期 2016.01.21
申请号 WO2015EP65968 申请日期 2015.07.13
申请人 DIENER, CHRISTOF-HERBERT 发明人 DIENER, CHRISTOF-HERBERT
分类号 H01J37/16;A61L2/14;H01J37/32;H01L21/67 主分类号 H01J37/16
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