发明名称 CHEMICAL LIQUID DISCHARGE MECHANISM, LIQUID PROCESSING APPARATUS, CHEMICAL LIQUID DISCHARGE METHOD, AND STORAGE MEDIUM
摘要 The present invention relates to a chemical liquid discharge mechanism for discharging a chemical liquid with relatively high viscosity, and is to provide a technique capable of decreasing the height occupied by a liquid discharge path of the chemical liquid. The chemical liquid discharge mechanism comprises: a storage unit which has a storage space in which a chemical liquid is stored; a diluent supply port which is opened to supply a diluent for lowering the viscosity of the chemical liquid; a vortex formation unit which supplies a fluid to the storage space to mix the diluent with the chemical liquid, and forms a vortex in the diluent and the chemical liquid; and a liquid discharge port which is opened toward the upper side of the diluent liquid supply port in the storage space so that the mixed diluent and chemical liquid are introduced by the supply of the diluent and discharged from the storage space. With such a configuration, it is possible to lower the viscosity of a waste liquid discharged from the liquid discharge port, and it is not necessary to increase the inclination of a liquid discharge path, with respect to a horizontal plane, connected to the liquid discharge port.
申请公布号 KR20160007392(A) 申请公布日期 2016.01.20
申请号 KR20150096662 申请日期 2015.07.07
申请人 TOKYO ELECTRON LIMITED 发明人 SASAGAWA NORIHIKO;INADA HIROICHI;HAMADA MASAHITO
分类号 H01L21/02;H01L21/67 主分类号 H01L21/02
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