发明名称 APPARATUS AND METHOD FOR TREATING SUBSTRATE
摘要 According to an embodiment of the present invention, a substrate treating device comprises: a housing having a treatment space for treating a substrate provided therein and having an opening formed therein; a door assembly having a cover movable to an opening location, which opens the opening, and a blocking location, which blocks the opening; and a detection member configured to detect a sealing state between the housing and the cover. The detection member comprises: a connection pipe connected to the housing to communicate with the treatment space; and a measurement sensor configured to measure an internal state of the connection pipe.
申请公布号 KR20160006353(A) 申请公布日期 2016.01.19
申请号 KR20140085455 申请日期 2014.07.08
申请人 SEMES CO., LTD. 发明人 KIM, SOO HYUCK;LIM, HUN SUB
分类号 H01L21/66;H01L21/02 主分类号 H01L21/66
代理机构 代理人
主权项
地址