| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas discharge pipe that is hardly closed even when used continuously for a long time, and also has a compact structure.SOLUTION: There is provided a gas discharge pipe 30 fitted in a vacuum chamber 11 of a sputtering film deposition apparatus 10 and having a plurality of gas discharge holes 31 for discharging a reactive gas, wherein the plurality of gas discharge holes 31 each increase in diameter stepwise from an entrance side to an exit side thereof, and an angle α contained between a center axis O thereof and a straight line connecting an exit-side end Eb of a part 31b having a smallest inner diameter and a part 31b having a second small inner diameter is 15-45° in a sectional shape cut with a plane passing the center axis O. |
