| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask inspection device, mask evaluation method and mask evaluation system capable of improving efficiencies of inspection and evaluation of a mask, by devising a cooperation method of a mask inspection device and a space image measurement device.SOLUTION: A mask inspection device 200 compares an optical image and a reference image at a comparison circuit 15, and supplies information following to a defect including a coordinate on a position where there is the defect, to a space image measurement device 300. The space image measurement device 300 reflects a defect coordinate and creates comparison reference information at a comparison reference information creation part 310. An optical system 320 illuminates a mask 1 by illumination light which has passed a filter 321, and creates a space image corresponding to the defect position transferred and exposed by a CCD camera 323 disposed on a focus surface via an aperture 322. A fatal degree determination part 330 uses the comparison reference information corresponding to the defect position and the space image, and determines a fatal degree based on calculation values of errors of line width and hole diameter. |
