| 摘要 |
PROBLEM TO BE SOLVED: To supply a chemical solution and a DIW in a wide flow range without changing a flow meter.SOLUTION: A cleaning unit includes a cleaning device 200 for cleaning a substrate and the like and a cleaning chemical solution feeding device 100 for feeding a cleaning chemical to a cleaning device 200. The cleaning chemical feeding device 100 comprises a chemical solution CLC113a and a chemical solution CLC113b. The chemical solution CLC113a is configured so that the chemical flow rate can be controlled in a first range and the chemical solution CLC113b is configured so that the chemical flow rate can be controlled in a second range in which a part thereof overlaps with the first range. The cleaning chemical solution feeding device 100 comprises a DIW CLC111a and a DIW CLC111b. The DIW CLC111a is configured so that the DIW flow rate can be controlled in a third range and the DIW CLC111b is configured so that the DIW flow rate can be controlled in a forth range in which a part thereof overlaps with the third range. |
