| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate heating apparatus which allows for uniform heating in the substrate plane, regardless of the substrate size, by using microwaves.SOLUTION: A supporting apparatus 5 has a plurality of microwave irradiation units 25 arranged, at a regular interval, in a direction parallel with a mounting surface 21a below a mounting plate 21. Each microwave irradiation unit 25 includes a microwave generator 41 generating microwaves, a microwave radiation port 43 radiating microwaves toward the mounting plate 21, a unit container 45 for supporting the microwave radiation port 43, and a microwave transmission path 47 for transmitting microwaves from the microwave generator 41 to the microwave radiation port 43. |
