| 摘要 |
PROBLEM TO BE SOLVED: To enhance in-plane uniformity of processing for each substrate, even if the arrangement pitch of substrate is reduced.SOLUTION: A substrate liquid processing apparatus includes a substrate holding tool (3120) for holding a plurality of substrates (W) while arranging in standing posture at intervals in the horizontal direction, a processing tank (3110) storing process liquid into which the substrate held by the substrate holding tool is immersed, and a nozzle (3190) provided in the processing tank, and discharging the process liquid toward the substrate from below the substrate held by the substrate holding tool. The substrate holding tool has a first holding part (3124A) for holding the substrates in a first group, out of the plurality of substrates, at a position of first height, and a second holding part (3124B) for holding the substrates in a second group, out of the plurality of substrates, at a position of second height lower than the first height position. |
