| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing device for a substrate material, which can practically operate while first inhibiting generation of a trailing undeveloped part, a base undeveloped part, scum residue, or the like, and secondary inhibiting generation of pattern defects such as pattern collapse and pattern scattering.SOLUTION: A developing device 6 develops a photosensitive resist C on an outer surface of a substrate material A by spraying a developer B through a spray nozzle 7 to the substrate material A. The spray nozzle 7 comprises a two-fluid nozzle, and mixes the developer B and air K to spray. The developer B sprayed is set to have particle diameter that can suppress generation of a trailing undeveloped part D, a base undeveloped part F, and scum residue E in the photosensitive resist C. The developer B and the air K are set to liquid pressure or air pressure that can suppress generation of pattern defects such as pattern collapse and pattern scattering in the photosensitive resist C. The developing device 6 can be used in combination with a developing device in an example of the prior arts. |
