| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method and a manufacturing apparatus for a gas barrier film excellent in a gas barrier property and an optical property, and a film thickness measuring method for facilitating the manufacture of said gas barrier property.SOLUTION: A gas barrier film manufacturing method for forming a gas barrier layer by a plasma reaction of a material gas in a vacuum chamber 10 is characterized in that said gas barrier layer is formed under the situation, in which a film 30 having a diffuse transmittance of 2% is formed on the surface of at least some of a plurality of members arranged on the inner wall or inside of said vacuum chamber 10. |
