发明名称 METHOD FOR MEASURING AN ANGULARLY RESOLVED INTENSITY DISTRIBUTION AND PROJECTION EXPOSURE APPARATUS
摘要 A method for measuring an angularly resolved intensity distribution in a reticle plane (24) of a projection exposure apparatus (10). The apparatus includes an illumination system (16), irradiating a reticle (22) arranged in the reticle plane (24) and having a first pupil plane (20). All planes of the projection exposure apparatus which are conjugate thereto are further pupil planes, and the reticle plane (24) and all planes which are conjugate thereto are field planes. The method includes: arranging a spatially resolving detection module (44) in the region of one of the field planes (24, 30) such that the detection module is at a smaller distance from this field plane than from the closest pupil plane (20), radiating electromagnetic radiation (21) onto an optical module (42) from the illumination system, and determining an angularly resolved intensity distribution of the radiation from a signal recorded by the detection module.
申请公布号 US2016011520(A1) 申请公布日期 2016.01.14
申请号 US201514796328 申请日期 2015.07.10
申请人 Carl Zeiss SMT GmbH 发明人 EMER Wolfgang;HELLWEG Dirk
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. A method for measuring an angularly resolved intensity distribution in a reticle plane of a projection exposure apparatus for microlithography comprising an illumination system, which is configured for irradiating a reticle arranged in the reticle plane and has a first pupil plane, wherein all planes of the projection exposure apparatus which are conjugate with respect to the first pupil plane are further pupil planes, and the reticle plane and all planes which are conjugate with respect to the reticle plane are field planes, comprising: arranging an optical module in a beam path of the projection exposure apparatus, arranging a spatially resolving detection module in a region of one of the field planes such that the detection module is at a smaller distance from the one field plane than from a closest one of the pupil planes, radiating electromagnetic radiation onto the optical module with the illumination system, and determining an angularly resolved intensity distribution of the radiated radiation from a signal recorded by the detection module.
地址 Oberkochen DE