ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

In the present invention, an active ray-sensitive or radiation-sensitive resin composition contains: a resin which contains a repeating unit represented by general formula (I) and a repeating unit represented by general formula (II), and in which the content of the repeating unit represented by general formula (II) is 10 mol.% or more of all the repeating units; and a compound that generates an acid upon irradiation with active rays or radiation.