| 摘要 |
This extreme ultraviolet light generation device generates extreme ultraviolet light by bringing a target into a plasma state by irradiating the target with pulsed laser light. The extreme ultraviolet light generation device may be provided with: a chamber; a magnet that is configured so as to form a magnetic field in the chamber; and an ion catcher including a collision section which is disposed such that ions introduced into the magnetic field collide therewith. |
