发明名称 ウェーハの研削方法
摘要 <p>PURPOSE: A method for grinding a wafer is provided to prevent the loading of a grinding wheel by filling a gap between a substrate and a chamfer with resins. CONSTITUTION: A light emitting layer(11) is laminated on the surface of a sapphire substrate(10). A chamfer(12) is formed in the outside of a surface(1a) of a wafer(1). An acryl based adhesive is coated on a surface(2a) of a hard substrate(2). The hard substrate is larger than the wafer. Resins(3) are filled in a gap between the chamfer and the hard substrate.</p>
申请公布号 JP5841738(B2) 申请公布日期 2016.01.13
申请号 JP20110083532 申请日期 2011.04.05
申请人 株式会社ディスコ 发明人 山口 崇;鈴木 将昭;國重 仁志;小山 真史;杉岡 優介;田中 和馬
分类号 H01L21/304;B24B1/00 主分类号 H01L21/304
代理机构 代理人
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