SUBSTRATE TREATMENT APPARATUS, DEVICE PRODUCTION SYSTEM, DEVICE PRODUCTION METHOD AND PATTERN FORMATION APPARATUS

摘要

PROBLEM TO BE SOLVED: To reduce further vibration applied to an exposure unit and thereby conduct adequately exposure with an exposure unit.SOLUTION: A substrate treatment apparatus U3 includes a vibration removal base 131 provided on the installation surface E, an exposure unit 121 which is provided on the vibration removal base 131 and conducts an exposure treatment of a supplied substrate P, a position adjustment unit 120 which is provided on the installation surface E in an independent state of being not in contact with the exposure unit 121 and serves as a treatment unit for conducting a treatment of the exposure unit 121 and a drive unit.