发明名称 FLUID HANDLING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a fluid handling device which can be manufactured by connecting a film in which a transfer layer is formed on one surface, to a substrate in which an open hole or a recess part is formed, and which can connect with sufficient contact pressure even when a connector such as a measurement instrument is pressed to the transfer layer on the film.SOLUTION: A fluid handling device has a substrate, a film, and a transfer layer. The substrate contains an open hole or a recess part. The film contains a first region, a second region, and third region. The transfer layer is arranged over the first region, the second region, and the third region, on one surface of the film. The first region is connected to one surface of the substrate so as to form a storage part by blocking one opening part of the open hole or the opening part of the recess part and so that a part of the transfer layer is exposed in the storage part. The second region is folded so that the transfer layer is positioned outside. The third region is connected to the first region of the film so that the transfer layer is exposed to outside.
申请公布号 JP2016003922(A) 申请公布日期 2016.01.12
申请号 JP20140123551 申请日期 2014.06.16
申请人 ENPLAS CORP 发明人 ONO KOICHI;KITAMOTO KEN
分类号 G01N35/08;B01J19/00;G01N37/00 主分类号 G01N35/08
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