发明名称 High mobility field effect transistor with ZN containing active layer, display device, sensor, and method of manufacturing field effect transistor
摘要 A field effect transistor including: a gate insulating film; an oxide semiconductor layer that serves as an active layer and whose main structural elements are Sn, Zn and O, or Sn, Ga, Zn and O; and an oxide intermediate layer that is disposed between the gate insulating film and the oxide semiconductor layer, and whose resistivity is higher than that of the oxide semiconductor layer.
申请公布号 US9236491(B2) 申请公布日期 2016.01.12
申请号 US201313967065 申请日期 2013.08.14
申请人 FUJIFILM Corporation 发明人 Takata Masahiro;Tanaka Atsushi
分类号 H01L29/10;H01L21/00;H01L29/786;H01L29/66;H01L27/146;G02F1/1368;H01L27/32 主分类号 H01L29/10
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A field effect transistor comprising: a gate insulating film; an oxide semiconductor layer that serves as an active layer and whose structural elements are Sn, Zn and O, or Sn, Ga, Zn and O; and an oxide intermediate layer that is disposed between the gate insulating film and the oxide semiconductor layer and whose structural elements are In, Ga, Zn, and O, and whose resistivity is higher than that of the oxide semiconductor layer, wherein, in a case in which an element composition ratio of the oxide semiconductor layer is Sn:Ga:Zn =a:b:c, the element composition ratio satisfies a+b=2, and 1≦a≦2, and 1≦c≦11/2,and c≧−7b/4+11/4.
地址 Tokyo JP