| 摘要 |
The present invention relates to a continuous type mask processing apparatus capable of reusing a rinse solution and, more particularly, to a continuous type mask processing apparatus capable of reusing a rinse solution used in a washing process, and in which a deposition process performed on a mask having a substrate attached thereon, and a washing process performed on the mask having the substrate detached therefrom after the deposition process is completed, are configured to be performed in one continuous process. Accordingly, the productivity can be improved by reducing a process time, and minimizing the number of masks used for the process can be maintained. Also, deposition and cleaning devices are separately equipped, thereby effectively reducing a contamination possibility caused by an external contamination source which may be generated when the mask is supplied to the deposition device again after washing the same through the cleaning device. Furthermore, the rinse solution is individually sprayed to upper and lower surfaces of the mask, and angles that the rinse solution is sprayed is controlled, so more effective rinse process is possible. A cooling system is applied, so the rinse solution, which is highly expensive, can be effectively reused. |
