HOLE PATTERN FOR UNIFORM ILLUMINATION OF WORKPIECE BELOW A CAPACITIVELY COUPLED PLASMA SOURCE

摘要

A plasma source assembly for use with a processing chamber comprises a blocker plate. The blocker plate has a first set of apertures within an inner electrical center of the blocker plate and smaller apertures around an outer peripheral edge. The apertures can decrease gradually in diameter from the electrical center outward to the peripheral edge or can be made of discrete increments with the smallest at the outer peripheral edge.