| 主权项 |
1. A plasma source (1) intended for the depositing of a coating on a substrate (9) and able to be connected to a power source (P), comprising:
a) an electrode (2) delimiting a discharge cavity (3) leading onto an aperture (6) opposite which the said substrate can be positioned, the cross-section of the said electrode comprising a first and a second side wall (21, 22) positioned either side of a bottom part (23, 24) provided with a central portion protruding into the said discharge cavity, the said central portion comprising a first and a second central wall (26, 27) and a top part (28) joining together the two central walls; b) a magnet assembly (4) located on the periphery of the said electrode and comprising a set of magnets connected together by a magnetic bracket (46), each of said magnets comprising an exposed pole directed towards the discharge cavity and a protected pole directed towards the said magnetic bracket, the said magnet assembly comprising:
i) at least a first and a second side magnet (41, 42), the said first side magnet, respectively second side magnet, being arranged behind the said first side wall (21) and second side wall (22) respectively, in the vicinity of the said aperture (6), the said side magnets being oriented such that their exposed poles have the same polarity;ii) at least a first and a second central magnet (43, 44), the said first central magnet, and second central magnet respectively, being arranged behind the said first central wall (26) and second central wall (27) respectively, the said two central magnets being oriented such that their exposed pole is of opposite polarity to that of the exposed poles of the side magnets;iii) at least one head magnet (45) arranged behind the said top part (28) and oriented such that its exposed pole is of same polarity as that of the exposed poles of the side magnets; c) an electrically insulating enclosure (5) arranged so as to surround the electrode and the magnets without obstructing the said aperture. |
