发明名称 MICROWAVE RAPID THERMAL PROCESSING OF ELECTROCHEMICAL DEVICES
摘要 Microwave radiation may be applied to electrochemical devices for rapid thermal processing (RTP) (including annealing, crystallizing, densifying, forming, etc.) of individual layers of the electrochemical devices, as well as device stacks, including bulk and thin film batteries and thin film electrochromic devices. A method of manufacturing an electrochemical device may comprise: depositing a layer of the electrochemical device over a substrate; and microwave annealing the layer, wherein the microwave annealing includes selecting annealing conditions with preferential microwave energy absorption in the layer. An apparatus for forming an electrochemical device may comprise: a first system to deposit an electrochemical device layer over a substrate; and a second system to microwave anneal the layer, wherein the second system is configured to provide preferential microwave energy absorption in the device layer.
申请公布号 US2016002771(A1) 申请公布日期 2016.01.07
申请号 US201514853551 申请日期 2015.09.14
申请人 Applied Materials, Inc. 发明人 SONG Daoying;Jiang Chong;Kwak Byung-Sung Leo
分类号 C23C14/58;H01M4/131;G02F1/155;C23C14/08;C23C14/34;H01M4/04;C23C14/24 主分类号 C23C14/58
代理机构 代理人
主权项 1. A method of manufacturing an electrochemical device comprising: depositing an electrochemical device stack over a substrate; and microwave annealing a layer in said electrochemical device stack, wherein said microwave annealing includes selecting annealing conditions with preferential microwave energy absorption in said layer, said layer reaching an annealing temperature, T, while surrounding layers in said electrochemical device stack experience a temperature less than T.
地址 Santa Clara CA US
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