METHOD FOR MANUFACTURING A CIRCULAR WAFER BY POLISHING THE PERIPHERY, INCLUDING A NOTCH OR ORIENTATION FLAT, OF A WAFER COMPRISING CRYSTAL MATERIAL, BY USE OF POLISHING TAPE

摘要

Provided is a method for producing a circular wafer using a grinding tape to grind the edge of a wafer comprising a crystalline material. A primary grinding step is provided for contacting a grinding body to the peripheral portion of a wafer placed centered on a horizontal stage and rotating the stage, thus grinding the peripheral portion. The radius of the wafer is measured, and a radius is set that is no greater than the measured smallest radius, and the difference Δr between the set radius and the measured wafer radius along the peripheral portion is determined. The portions of the peripheral portion at which Δr is greater than a predetermined value are determined and a secondary grinding step is provided for contacting the peripheral portion and the grinding body, rotating the stage forwards and backwards in a predetermined range of rotational angles, and grinding the peripheral portion.

主权项

1. A method for manufacturing a circular wafer by polishing the periphery of a disc-shaped wafer comprising a crystal material by use of a polishing tape, the periphery having an orientation flat and a periphery part, comprising:
a primary polishing step for polishing the periphery part of a wafer centered on a horizontal wafer stage having a vertical rotation axis by rotating the wafer stage with the periphery part and a polishing element being brought into contact with each other; a determining step for determining differences Δr between measured radiuses and a set radius along the periphery part, the measured radiuses being obtained by measuring radiuses of the wafer along the periphery part, the wafer having been subjected to the primary polishing and the set radius being less than or equal to the minimum radius among the measured radiuses; a determining step for determining a portion of the periphery part of the wafer subjected to the primary polishing, the portion having Δr greater than a predetermined value; and a secondary polishing step for polishing the periphery part subjected to the primary polishing by rotating the wafer stage forward and backward about the rotation axis in the range of a predetermined rotation angle with the periphery part of the wafer subjected to the primary polishing and a polishing element being brought into contact with each other; wherein the polishing element comprises a polishing tape disposed on a flat polishing pad to define a flat polishing surface, and wherein, in the secondary polishing step, the orientation flat is not parallel to the polishing surface when they face each other, the wafer stage and the polishing surface are relatively oscillated along a horizontal axis, and the speed of the forward or backward rotation of the wafer stage is reduced in the range of a rotation angle corresponding to the determined portion of the periphery part of the wafer.