发明名称 ETCHING SOLUTION COMPOSITION FOR METAL LAYER AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY USING THE SAME
摘要 The present invention provides an etching solution and a method for manufacturing an array substrate for a liquid crystal display comprising: a metal film oxidizing agent; a compound wherein a carboxylic acid group exists in an end and a hydroxyl group is substituted in α and β carbon; and water.
申请公布号 KR20160001292(A) 申请公布日期 2016.01.06
申请号 KR20140079553 申请日期 2014.06.27
申请人 DONGWOO FINE-CHEM CO., LTD. 发明人 CHOI, HAN YOUNG;KIM, HYOUN WOO;JEON, HYUN SU;CHO, SEONG BAE
分类号 C23F1/14;C09K13/04;C23F1/18;H01L21/306 主分类号 C23F1/14
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