System for aligning patterns on a substrate

摘要

A system for aligning a first and second pattern based on alignment structures is disclosed. The system comprises a first substrate including the first alignment structure. The alignment structure has a different magnitude of the electrical characteristic than the substrate. The system also includes an electrical probe and a controller for controlling the relative position of the probe with respect to the substrate to measure the electrical characteristic at a plurality of positions proximate the substrate. The measured electrical characteristics are used to identify the location of the alignment structure by identifying a difference between the measured electrical characteristic at pairs of the plurality of positions. A controller identifies the location of a second alignment structure formed on a second substrate. A registration mechanism aligns the two substrates using the identified locations of the first and second alignment structures.

主权项

1. A system for aligning a second pattern to a first pattern based on a first alignment structure having a location identified by measurements of an electrical characteristic, comprising:
a first substrate having the first pattern including the first alignment structure, wherein the first alignment structure has a different magnitude of the electrical characteristic than the first substrate; an electrical probe; a controller for controlling the relative position of the electrical probe with respect to the first substrate to measure the electrical characteristic corresponding to each of a plurality of positions at or near the first alignment structure, for comparing the measured electrical characteristic as a function of position of the electrical probe to identify the location of the first alignment structure by identifying a difference between the measured electrical characteristic at a pair of the plurality of positions exceeding a predetermined threshold; a second substrate having the second pattern including a second alignment structure formed thereon; a controller for identifying the location of the second alignment structure; and a registration mechanism for aligning the second substrate to the first substrate using the identified locations of the first and second alignment structures.