发明名称 Imprint lithography template
摘要 Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.
申请公布号 US9227361(B2) 申请公布日期 2016.01.05
申请号 US201314026775 申请日期 2013.09.13
申请人 Canon Nanotechnologies, Inc. 发明人 Choi Byung-Jin;Choi Yeong-Jun;Selinidis Kosta S.;Shackleton Steven C.
分类号 B29C59/00;B82Y10/00;B82Y40/00;G03F7/00 主分类号 B29C59/00
代理机构 代理人 King Cameron A.
主权项 1. A method, comprising: providing fluid in an inner channel of an imprint lithography template, the inner channel positioned adjacent to an active area of the template, the inner channel having an aperture and a port, the port constructed to provide the inner channel in fluid communication with a process gas supply and the aperture constructed to provide the inner channel in fluid communication with atmosphere adjacent to the second surface of the body; and, confining the fluid between the active area of the template and a substrate positioned in superimposition with the template, wherein confining includes evacuating fluid through an outer channel, the outer channel positioned at a distance from the active area of the template, wherein the distance between the active area and the outer channel is constructed such that the outer channel evacuates fluid and simultaneously confines fluid within a circumference of the outer channel during an imprint lithography process.
地址 Austin TX US