Ferromagnetic material sputtering target

摘要

A ferromagnetic material sputtering target made of metal having a composition containing 20 mol % or less of Cr, and Co as the remainder thereof, wherein the structure of the target includes a metallic substrate (A), and, in the metallic substrate (A), a spherical phase (B) containing 90 wt % or more of Co in which the difference between the longest diameter and the shortest diameter is 0 to 50%. Provided is a ferromagnetic material sputtering target capable of improving the leakage magnetic flux to obtain a stable electrical discharge with a magnetron sputtering device.

主权项

1. A ferromagnetic material sputtering target having a composition comprising metal elements including 20 mol % or less of Cr and Co as the remainder, wherein the sputtering target has a structure comprising a metallic matrix (A) and a metallic phase (B) dispersed in the metallic matrix (A), the metallic phase (B) having a Co content of 90 wt % or more and being in a form of a plurality of separate spherical, pseudo-spherical, oblate spheroidal, or pseudo-oblate spheroidal shaped particles such that a difference in length of a shortest diameter of each of the metallic phase (B) particles and a longest diameter of each the metallic phase (B) particles is 0 to 50% of the longest diameter, wherein a maximum magnetic permeability of the metallic phase (B) is higher than that of the metal matrix (A) surrounding the metallic phase (B), wherein the metallic phase (B) contained in the sputtering target has as a whole a volume of 20 vol % or more of a total volume of the sputtering target, and wherein each of the particles of the metallic phase (B) has a size of 30 to 150 μm.