| 发明名称 |
MASK, METHOD FOR MANUFACTURING THE SAME AND PROCESS DEVICE |
| 摘要 |
A mask and a method of making the mask are disclosed. The mask includes a transition region including at least one first region having a first thickness, and an active region having another thickness, where the thickness of the active region is greater than the first thickness. The method of making the mask includes forming a plurality of patterns in a mask body, the patterns being formed in regions of the mask body corresponding with the active region and the transition region of the mask. |
| 申请公布号 |
US2015376765(A1) |
申请公布日期 |
2015.12.31 |
| 申请号 |
US201414515434 |
申请日期 |
2014.10.15 |
| 申请人 |
Shanghai Tianma AM-OLED Co., Ltd. ;Tianma Micro-Electronics Co., Ltd. |
发明人 |
XIONG Zhiyong;Qian Dong;Wei Yunyan |
| 分类号 |
C23C14/04;C23C14/24 |
主分类号 |
C23C14/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A mask, comprising:
a transition region comprising at least one first region having a first thickness; and an active region having another thickness, wherein the thickness of the active region is greater than the first thickness. |
| 地址 |
Shanghai CN |
