发明名称 Device and method for imprint lithography
摘要 <p>Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114; 116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer (14). <IMAGE></p>
申请公布号 EP1594001(B1) 申请公布日期 2015.12.30
申请号 EP20040445057 申请日期 2004.05.07
申请人 OBDUCAT AB 发明人 HEIDARI, BABAK;BECK, MARC
分类号 G03F7/00;B29C43/02;B29C43/10;B81C99/00;G03F1/00;G03F7/20;H01L21/00 主分类号 G03F7/00
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