Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method

摘要

An exposure method and apparatus exposes a substrate that is loaded on a stage via a carrier system, with an exposure beam via a projection optical system and a liquid. An object carried by the carrier system is mounted in a depressed section of the stage. Information on a positional relation between the object mounted in the depressed section and the depressed section is obtained. The substrate is loaded on the stage based on the obtained information so that the substrate carried to above the stage by the carrier system is mounted in the depressed section. A part of the substrate mounted in the depressed section is irradiated with the exposure beam via the projection optical system and a liquid immersion area formed by the liquid under the projection optical system.

主权项

1. An exposure method of exposing a substrate that is loaded on a stage via a carrier system, with an exposure beam via a projection optical system and a liquid, the method comprising:
mounting an object carried by the carrier system, in a depressed section of the stage; obtaining information on a positional relation between the object mounted in the depressed section and the depressed section; loading the substrate on the stage based on the obtained information so that the substrate carried to above the stage by the carrier system is mounted in the depressed section; and irradiating a part of the substrate mounted in the depressed section with the exposure beam via the projection optical system and a liquid immersion area formed by the liquid under the projection optical system, wherein in the loading of the substrate, at least one of the carrier system and the stage is controlled based on the obtained information.