Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same

摘要

Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less,
(A) a repeating unit containing a group capable of decomposing and forming an acid upon irradiation with an actinic ray or radiation,(B) a repeating unit containing a group capable of decomposing and forming a carboxylic acid by the action of an acid, and(C) a repeating unit containing a carbon-carbon unsaturated bond.

主权项

1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
(P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less,
(A) a repeating unit containing a group capable of decomposing and forming an acid upon irradiation with an actinic ray or radiation,(B) a repeating unit containing a group capable of decomposing and forming a carboxylic acid by the action of an acid, and(C) a repeating unit containing a carbon-carbon unsaturated bond, wherein the repeating unit (A) has on the side chain a group capable of decomposing and generating an acid upon irradiation with an actinic ray or radiation and the acid comprises a group represented by any one of the following structures: —CH2—SO3H, —CH2—CF2—CF2—SO3H, —OCO—CF2—SO3H, —CHF—CF2—SO3H, —CH2—SO2—NH—SO2—CF3, and —CF2—SO2—NH—SO2—CF3, wherein the compositional amount (mol) of the repeating unit (B) and the repeating unit (C) in the resin (P) satisfies a relationship of the repeating unit (B)≦the repeating unit (C).