| 发明名称 | Gas gauge compatible with vacuum environments | ||
| 摘要 | In one embodiment of the present invention, there is provided a gas gauge for use in a vacuum environment having a measurement gas flow channel. The gas gauge may comprise a measurement nozzle in the measurement gas flow channel. The measurement nozzle may be configured to operate at a sonically choked flow condition of a volumetric flow being sourced from a gas supply coupled to the measurement gas flow channel. The gas gauge may further comprise a pressure sensor operatively coupled to the measurement gas flow channel downstream from the sonically choked flow condition of the volumetric flow to measure a differential pressure of the volumetric flow for providing an indication of a gap between a distal end of the measurement nozzle and a target surface proximal thereto. | ||
| 申请公布号 | US9222847(B2) | 申请公布日期 | 2015.12.29 |
| 申请号 | US201314102667 | 申请日期 | 2013.12.11 |
| 申请人 | ASML Holding N.V. | 发明人 | Schultz Geoffrey Alan |
| 分类号 | G03B27/52;G01L13/02;G01B13/12;G03F9/00 | 主分类号 | G03B27/52 |
| 代理机构 | Sterne, Kessler, Goldstein & Fox P.L.L.C. | 代理人 | Sterne, Kessler, Goldstein & Fox P.L.L.C. |
| 主权项 | 1. A gas gauge configured to be used in a vacuum environment, comprising: a measurement nozzle in a measurement gas flow channel, the measurement nozzle being configured to provide a gas flow supplied by a gas supply; a pressure port; and a pressure sensor operatively coupled between the pressure port and the measurement nozzle configured to measure a differential pressure between a first pressure within the measurement nozzle and a second vacuum pressure at the pressure port to provide an indication of a gap between a distal end of the measurement nozzle and a target surface proximal thereto. | ||
| 地址 | Veldhoven NL | ||