| 摘要 |
PROBLEM TO BE SOLVED: To provide a thinner composition for improving coating property of a resist and for removing a resist, and a method for manufacturing a semiconductor device or a thin film transistor liquid crystal display device using the composition.SOLUTION: The thinner composition for improving coating property of a resist and for removing a resist includes 10 to 80 wt.% of an alkyl (having 1 to 5 carbon atoms) 2-hydroxyisobutyrate, 20 to 90 wt.% of a propyleneglycol alkyl (having 1 to 5 carbon atoms) ether acetate, and 10 to 1000 ppm of a surfactant represented by Formula 1 with respect to the total weight of the alkyl 2-hydroxyisobutyrate and the propyleneglycol alkylether acetate. The thinner composition exhibits excellent solubility to various photoresists and bottom anti-reflective coatings (BARC), is applicable to a process of regenerating a photoresist-coated wafer, and remarkably improves a RRC (reducing resist consumption) process and coating property of a photoresist. The present invention also relates to a method for manufacturing a semiconductor device or a thin film transistor liquid crystal display device, which includes a step of removing a photoresist by using the above thinner composition. |
