发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes a first electrode, a second electrode, a first semiconductor region that is formed between the first electrode and the second electrode and is in contact with the first electrode, a second semiconductor region that is formed between the first semiconductor region and the second electrode, a contact region that is formed between the second semiconductor region and the second electrode and is in contact with the second semiconductor region and the second electrode, a plurality of third semiconductor regions that are formed between the second electrode and the first semiconductor region and are in contact with the second electrode, and a wiring that is in contact with the second electrode, a portion of the wiring bonded to the second electrode being positioned above the third semiconductor region and not positioned above the contact region.
申请公布号 US2015372153(A1) 申请公布日期 2015.12.24
申请号 US201414475568 申请日期 2014.09.02
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HORI Yoichi;NODA Takao;OTA Tsuyoshi
分类号 H01L29/868;H01L29/66;H01L23/528;H01L29/872 主分类号 H01L29/868
代理机构 代理人
主权项 1. A semiconductor device comprising: a first electrode; a second electrode; a first semiconductor region of a first conductivity type located between the first electrode and the second electrode and is in contact with the first electrode; a second semiconductor region of a second conductivity type that is selectively located between the first semiconductor region and the second electrode; a plurality of contact regions located between the second semiconductor region and the second electrode, each contact region being in contact with the second semiconductor region and the second electrode; a plurality of third semiconductor regions of a second conductivity type located between the second electrode and the first semiconductor region and in contact with the second electrode; and a wiring in contact with the second electrode via a bonding portion, the bonding portion of the wiring bonded to the second electrode at a location between the contact regions adjacent to the third semiconductor region.
地址 Tokyo JP