半導体装置の製造方法,申请号JP20120202128-传众专利搜索

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发明名称	半導体装置の製造方法
摘要
申请公布号	JP5835170(B2)	申请公布日期	2015.12.24
申请号	JP20120202128	申请日期	2012.09.13
申请人	豊田合成株式会社	发明人	村上倫章;岡徹
分类号	H01L21/28;H01L21/3065;H01L21/31;H01L21/336;H01L21/337;H01L21/338;H01L29/12;H01L29/778;H01L29/78;H01L29/808;H01L29/812	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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