APPARATUS FOR PROVIDING ION BEAM AND SYSTEM FOR REMOVING STATIC ELECTRICITY IN HIGH VACUUM INCLUDING THE APPARATUS

摘要

A device for providing an ion beam comprises: a plasma accommodation part configured to generate plasma or accommodate the generated plasma; an injection part configured to inject the plasma or a plasma source gas into the plasma accommodation part; a differential pump connected to the plasma accommodation part to discharge the plasma to the outside; and an ion discharging part configured to guide an ion in the plasma of the plasma accommodation part to a vacuum system.