Imprinting apparatus, imprinting method, and manufacturing method of uneven plate

摘要

According to one embodiment, an imprinting apparatus includes an ejecting unit, a stage, a moving unit, and an observation unit. The ejecting unit ejects and drips a hardening resin material onto a substrate to be processed. The substrate to be processed is placed onto the stage. The moving unit relatively moves the ejecting unit and the stage. The observation unit observes the dripped hardening resin material and the pattern with the state in which the dripped hardening resin material and the pattern are overlaid on a plane, before the template is brought into contact with the hardening resin material.

主权项

1. An imprinting method in which a hardening resin material is dripped onto a substrate to be processed, and a pattern that is formed to have irregularities on a template is transferred onto the hardening resin material dripped onto the substrate to be processed, the imprinting method comprising:
ejecting and dripping the hardening resin material onto the substrate to be processed from an ejecting unit; moving relatively a stage on which the substrate to be processed is placed and the ejecting unit in order to drip the hardening resin material onto the desired position; and observing the dripped hardening resin material and the pattern in a state in which the dripped hardening resin material and the pattern are overlaid on a plane, before the template is brought into contact with the hardening resin material, wherein the template has a first pattern configured to transfer desired irregularities onto the hardening resin material, and a second pattern configured to observe the dripped position of the hardening resin material, and the pattern observed before the template is brought into contact with the hardening resin material is the second pattern.