| 发明名称 | Gas barrier film | ||
| 摘要 | An object of the invention is to provide a gas barrier characteristic film that has a gas barrier characteristic and that is excellent in the repetitive reproducibility of the gas barrier characteristic. The film is a gas barrier characteristic film in which an [A] layer and a [B] layer mentioned below are sequentially layered on at least one surface of a macromolecular base, the [A] layer being a crosslinked resin layer whose pencil hardness is greater than or equal to H and whose surface free energy is less than or equal to 45 mN/m, and the [B] layer being a silicon-containing inorganic layer whose thickness is 10 to 1000 nm. | ||
| 申请公布号 | US9219018(B2) | 申请公布日期 | 2015.12.22 |
| 申请号 | US201214009664 | 申请日期 | 2012.03.29 |
| 申请人 | Toray Industries, Inc. | 发明人 | Uebayashi Hiroyuki;Tsukamura Yusuke;Watanabe Osamu |
| 分类号 | H01L23/28;H01L31/0203;H01L31/0216;H01L31/048;H01L33/52;H01L23/29;H01L23/00;H01L33/54;H01L31/0392;C09D1/00;H01L51/52 | 主分类号 | H01L23/28 |
| 代理机构 | RatnerPrestia | 代理人 | RatnerPrestia |
| 主权项 | 1. A gas barrier characteristic film in which an [A] layer and a [B] layer are layered in this order on at least one surface of the macromolecular base, the [A] layer being a crosslinked resin layer whose pencil hardness is greater than or equal to H and whose surface free energy is less than or equal to 45 mN/m, and the [B] layer being a silicon-containing inorganic layer whose thickness is 10 to 1000 nm. | ||
| 地址 | Tokyo JP | ||