Flowable carbon film by FCVD hardware using remote plasma PECVD

摘要

Embodiments of the present invention generally relate to methods for forming a flowable carbon-containing film on a substrate. In one embodiment, an oxygen-containing gas is flowed into a remote plasma region to produce oxygen-containing plasma effluents, and a carbon-containing gas is combined with the oxygen-containing plasma effluents in a substrate processing region which contains the substrate. A carbon-containing film is formed in trenches which are formed on the substrate and a low K dielectric material is deposited on the carbon-containing film in the trenches. The carbon-containing film is decomposed by an UV treatment and airgaps are formed in the trenches under the low K dielectric material.

主权项

1. A method for forming airgaps in trenches formed on a substrate, comprising:
forming a flowable carbon-containing film in a first portion of the trenches, comprising:
providing a carbon-containing gas to a substrate processing region in a chemical vapor deposition chamber;providing an oxygen-containing gas to a remote plasma system to form oxygen-containing plasma effluents;introducing the plasma effluents into the substrate processing region; andreacting the plasma effluents and the carbon-containing gas to form the flowable carbon-containing film in the first portion of the trenches; forming a low K dielectric material on the flowable carbon-containing film in a second portion of the trenches; and removing the flowable carbon-containing film to form the airgaps in the first portion of the trenches.