发明名称 Liquid ejecting apparatus
摘要 A liquid ejecting apparatus includes a liquid ejecting head ejecting liquid from nozzles thereof formed on a nozzle formation surface onto a target that is being transported; and a rotating member rotatably disposed opposite the nozzle formation surface, the rotating member having a supporting surface for supporting the target and an absorbing surface for absorbing the liquid ejected from the nozzle. The rotating member has such a configuration that a first maximum length from a rotational center to the absorbing surface is longer than a second maximum length from the rotational center to the supporting surface.
申请公布号 US9216582(B2) 申请公布日期 2015.12.22
申请号 US201012939134 申请日期 2010.11.03
申请人 Seiko Epson Corporation 发明人 Akahane Takashi
分类号 B41J2/165;B41J11/04 主分类号 B41J2/165
代理机构 Kilpatrick Townsend & Stockton LLP 代理人 Kilpatrick Townsend & Stockton LLP
主权项 1. A liquid ejecting apparatus comprising: a liquid ejecting head ejecting liquid from nozzles thereof formed on a nozzle formation surface onto a target that is being transported; and a rotating member rotatably disposed opposite the nozzle formation surface, the rotating member having a supporting surface for supporting the target and an absorbing surface for absorbing the liquid ejected from the nozzles, and a first maximum length from a rotational center to the absorbing surface in a direction perpendicular to the nozzle formation surface, when the absorbing surface is facing the nozzle formation surface, is longer than a second maximum length from the rotational center to the supporting surface in the direction perpendicular to the nozzle formation surface, when the supporting surface is facing the nozzle formation surface, wherein the first maximum length in the direction perpendicular to the nozzle formation surface when the absorbing surface is facing the nozzle formation surface is shorter than a distance from the rotational center to the nozzle formation surface, wherein a distance between the absorbing surface and the nozzle formation surface when the liquid is ejected from the nozzles toward the absorbing surface not in contact with the nozzle surface is shorter than a distance between the supporting surface and the nozzle formation surface when the liquid is ejected onto the target.
地址 Tokyo JP