发明名称 SPUTTERING TARGET STORAGE CONTAINER AND SPUTTERING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a sputtering target storage container capable of stabilizing the position of a sputtering target in a liquid state in the container during sputtering, and a sputtering device with the container.SOLUTION: A container 1 includes a storage part 2. The storage part 2 includes an outer peripheral part 3 and an inner surface 5. The inner surface 5 is shaped to be hollowed deeper from the outer peripheral part 3 toward a center part 4 of a region encircled with the outer peripheral part 3. Gallium 6 is stored in the hollow. The container has, for example, a circular outer shape in plan view, and is formed of a conductive material such as copper (Cu). In the diagram, a sputtering gas being cationized strikes on the gallium 6, which is molten with heat generated at the time to become liquid. The storage part 2 has the inner surface 5 having a curvature.
申请公布号 JP2015229782(A) 申请公布日期 2015.12.21
申请号 JP20140115345 申请日期 2014.06.04
申请人 NISSIN ELECTRIC CO LTD 发明人 WATANABE TETSUYA
分类号 C23C14/34;C23C14/35;H01L21/203 主分类号 C23C14/34
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