| 摘要 |
PROBLEM TO BE SOLVED: To provide a new bicyclohexane derivative compound that is useful for a modifier for a photoresist resin or a dry etching durability improving agent in a field of photolithography, agricultural or pharmaceutical intermediates, various industrial products, and the like.SOLUTION: The bicyclohexane derivative compound is represented by the formula (VI). In the formula, Y each independently represents an alkyl group having 1 to 10 carbon atoms, halogen, acyloxy group, alkoxycarbonyl group, or hydroxyl group; m represents an integer of 0 to 11; m' represents an integer of 0 to 10; and Rto Reach independently represent H or an alkyl group having 1 to 3 carbon atoms. |
